Ultrathin sputter-deposited plasmonic silver nanostructures.

ABSTRACT: In this study, ultrathin silver plasmonic nanostructures are fabricated by sputter deposition on substrates patterned by nanoimprint lithography, without additional lift-off processes. Detailed investigation of silver growth on different substrates results in a structured, defect-free silver film with thickness down to 6 nm, deposited on a thin layer of doped zinc oxide. Variation of the aspect ratio of the nanostructure reduces grain formation at the flanks, allowing for well-separated disk and hole arrays, even though conventional magnetron sputtering is less directional than evaporation. The resulting disk-hole array features high average transmittance in the visible range of 71% and a strong plasmonic dipole resonance in the near-infrared region. It is shown that the ultrathin Ag film

SUBMITTER: Goetz S 

PROVIDER: S-EPMC9418784 | biostudies-literature | 2020 Feb

REPOSITORIES: biostudies-literature