Investigation of Morphological, Optical, and Dielectric Properties of RF Sputtered WO_x Thin Films for Optoelectronic Applications.

ABSTRACT: Tungsten oxide (WO_x) thin films were synthesized through the RF magnetron sputtering method by varying the sputtering power from 30 W to 80 W. Different investigations have been conducted to evaluate the variation in different morphological, optical, and dielectric properties with the sputtering power and prove the possibility of using WO_x in optoelectronic applications. An Energy Dispersive X-ray (EDX), stylus profilometer, and atomic force microscope (AFM) have been used to investigate the dependency of morphological properties on sputtering power. Transmittance, absorbance, and reflectance of the films, investigated by Ultraviolet-Visible (UV-Vis) spectroscopy, have allowed for further determination of some necessary parameters, such as absorption coefficient, pene

SUBMITTER: Mahjabin S 

PROVIDER: S-EPMC9565653 | biostudies-literature | 2022 Oct

REPOSITORIES: biostudies-literature