NiN-Passivated NiO Hole-Transport Layer Improves Halide Perovskite-Based Solar Cell.
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ABSTRACT: The interfaces between inorganic selective contacts and halide perovskites (HaPs) are possibly the greatest challenge for making stable and reproducible solar cells with these materials. NiOx, an attractive hole-transport layer as it fits the electronic structure of HaPs, is highly stable and can be produced at a low cost. Furthermore, NiOx can be fabricated via scalable and controlled physical deposition methods such as RF sputtering to facilitate the quest for scalable, solvent-free, vacuum-deposited HaP-based solar cells (PSCs). However, the interface between NiOx and HaPs is still not well-controlled, which leads at times to a lack of stability and Voc losses. Here, we use RF sputtering to fabricate NiOx
SUBMITTER: Itzhak A
PROVIDER: S-EPMC9614719 | biostudies-literature | 2022 Oct
REPOSITORIES: biostudies-literature
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