Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO₂.

ABSTRACT: The surface chemistry of the initial growth during the first or first few precursor cycles in atomic layer deposition is decisive for how the growth proceeds later on and thus for the quality of the thin films grown. Yet, although general schemes of the surface chemistry of atomic layer deposition have been developed for many processes and precursors, in many cases, knowledge of this surface chemistry remains far from complete. For the particular case of HfO₂ atomic layer deposition on a SiO₂ surface from an alkylamido-hafnium precursor and water, we address this lack by carrying out an operando atomic layer deposition experiment during the first cycle of atomic layer deposition. Ambient-pressure X-ray photoelectron spectroscopy and density functional theory to

SUBMITTER: D'Acunto G 

PROVIDER: S-EPMC9879184 | biostudies-literature | 2023 Jan

REPOSITORIES: biostudies-literature