Unmasking the Resolution-Throughput Tradespace of Focused-Ion-Beam Machining.

ABSTRACT: Focused-ion-beam machining is a powerful process to fabricate complex nanostructures, often through a sacrificial mask that enables milling beyond the resolution limit of the ion beam. However, current understanding of this super-resolution effect is empirical in the spatial domain and nonexistent in the temporal domain. This article reports the primary study of this fundamental tradespace of resolution and throughput. Chromia functions well as a masking material due to its smooth, uniform, and amorphous structure. An efficient method of in-line metrology enables characterization of ion-beam focus by scanning electron microscopy. Fabrication and characterization of complex test structures through chromia and into silica probe the response of the bilayer to a focused beam of gallium cations

SUBMITTER: Madison AC 

PROVIDER: S-EPMC9945459 | biostudies-literature | 2022 Sep

REPOSITORIES: biostudies-literature