Hole, Convex, and Silver Nanoparticle Patterning on Polystyrene Nanosheets by Colloidal Photolithography at Air-Water Interfaces.

ABSTRACT: Colloidal photolithography is a versatile advanced technique for fabricating periodic nanopatterned arrays, with patterns carved exclusively on photoresist films deposited on solid substrates in a typical photolithographic process. In this study, we apply colloidal photolithography to polystyrene (PS) films half-covered with poly(methyl methacrylate) (PMMA) colloids at the air-water interface and demonstrate that periodic hole structures can be carved in PS films by two processes: photodecomposing PS films with ultraviolet (UV) light and removing PMMA colloids with a fluorinated solvent. Nonspherical holes, such as C-shaped and chiral comma-shaped holes, are also fabricated by regulating the UV illumination conditions. Furthermore, in addition to holes, convex patterns on PS films are real

SUBMITTER: Kaneko R 

PROVIDER: S-EPMC9261183 | biostudies-literature | 2022 Jul

REPOSITORIES: biostudies-literature