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Growth of highly conducting MoS2-xNx thin films with enhanced 1T' phase by pulsed laser deposition and exploration of their nanogenerator application.


ABSTRACT: High-quality growth of MoS2-xNx films is realized on single-crystal c-Al2O3 substrates by the pulsed laser deposition (PLD) in ammonia rendering highly stable and tunable 1T'/2H biphasic constitution. Raman spectroscopy reveals systematic enhancement of 1T' phase component due to the incorporation of covalently bonded N-doping in MoS2 lattice, inducing compressive strain. Interestingly, the film deposited at 300 mTorr NH3 shows ∼80% 1T' phase. The transport measurements performed on MoS2-xNx films deposited at 300 mTorr NH3 display very low room temperature resistivity of 0.03 mΩ-cm which is 100 times enhanced over the undoped MoS2 grown under comparable conditions. A triboelectric nanogenerator (TENG) device containing biphasic MoS2-xNx film as an electron acceptor exhibits a clear enhancement in the output voltage as compared to the pristine MoS2. Device architecture, p-type N doping in MoS2 lattice, favorably increased work-function, multiphasic component of MoS2, and increased surface roughness synergistically contribute to superior TENG performance.

SUBMITTER: Parmar S 

PROVIDER: S-EPMC8881714 | biostudies-literature | 2022 Mar

REPOSITORIES: biostudies-literature

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Growth of highly conducting MoS<sub>2-x</sub>N<sub>x</sub> thin films with enhanced 1T' phase by pulsed laser deposition and exploration of their nanogenerator application.

Parmar Swati S   Prajesh Neetu N   Wable Minal M   Choudhary Ram Janay RJ   Gosavi Suresh S   Boomishankar Ramamoorthy R   Ogale Satishchandra S  

iScience 20220210 3


High-quality growth of MoS<sub>2-x</sub>N<sub>x</sub> films is realized on single-crystal <i>c</i>-Al<sub>2</sub>O<sub>3</sub> substrates by the pulsed laser deposition (PLD) in ammonia rendering highly stable and tunable 1T'/2H biphasic constitution. Raman spectroscopy reveals systematic enhancement of 1T' phase component due to the incorporation of covalently bonded N-doping in MoS<sub>2</sub> lattice, inducing compressive strain. Interestingly, the film deposited at 300 mTorr NH<sub>3</sub> s  ...[more]

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