Alternatives to aluminum gates for silicon quantum devices: defects and strain.

ABSTRACT: Gate-defined quantum dots (QD) benefit from the use of small grain size metals for gate materials because it aids in shrinking the device dimensions. However, it is not clear what differences arise with respect to process-induced defect densities and inhomogeneous strain. Here, we present measurements of fixed charge, Q _f , interface trap density, D _it , the intrinsic film stress, σ, and the coefficient of thermal expansion, α as a function of forming gas anneal temperature for Al, Ti/Pd, and Ti/Pt gates. We show D _it is minimal at an anneal temperature of 350 °C for all materials but Ti/Pd and Ti/Pt have higher Q _f and D _it compared to Al. In addition,

SUBMITTER: Stein RM 

PROVIDER: S-EPMC9890375 | biostudies-literature | 2021

REPOSITORIES: biostudies-literature