Decomposition Characteristics of the TTIP (Tetraisopropyl Orthotitanate) Precursor for Atomic Layer Deposition.

ABSTRACT: The decomposition of tetraisopropyl orthotitanate (TTIP), a representative precursor used in the atomic layer deposition (ALD) of titanium dioxide (TiO₂) film, and the resulting changes in the thin film properties of the TiO₂ film were investigated. TTIP was evaluated after exposure to thermal stress in an enclosed container. The vapor pressure results provide reasonable evidence that impurities are generated by the decomposition of TTIP under thermal stress. These impurities led to changes in the thermal properties of TTIP and changes in the growth rate, morphology, and composition of the thin film; in particular, these impurities increased the unstable oxidation states of Ti²⁺ (TiO) content in the TiO₂ film. The changes in the properties of the

SUBMITTER: Kim H 

PROVIDER: S-EPMC9100524 | biostudies-literature | 2022 Apr

REPOSITORIES: biostudies-literature