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Atomic Diffusion of Indium through Threading Dislocations in InGaN Quantum Wells.

ABSTRACT: The compositional and structural investigations of threading dislocations (TDs) in InGaN/GaN multiple quantum wells were carried out using correlative transmission electron microscopy (TEM) and atom probe tomography (APT). The correlative TEM/APT analysis on the same TD reveals that the indium atoms are diffused along the TD and its concentration decreases with distance from the InGaN layer. On the basis of the results, we directly observed that the indium atoms originating from the InGaN layer diffuse toward the epitaxial GaN surface through the TD, and it is considered to have occurred via the pipe diffusion mechanism induced by strain energy relaxation.

SUBMITTER: Yamaguchi Y

PROVIDER: S-EPMC9480092 | biostudies-literature | 2022 Sep

REPOSITORIES: biostudies-literature

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Atomic Diffusion of Indium through Threading Dislocations in InGaN Quantum Wells.

Yamaguchi Yudai Y Kanitani Yuya Y Kudo Yoshihiro Y Uzuhashi Jun J Ohkubo Tadakatsu T Hono Kazuhiro K Tomiya Shigetaka S

Nano letters 20220901 17

The compositional and structural investigations of threading dislocations (TDs) in InGaN/GaN multiple quantum wells were carried out using correlative transmission electron microscopy (TEM) and atom probe tomography (APT). The correlative TEM/APT analysis on the same TD reveals that the indium atoms are diffused along the TD and its concentration decreases with distance from the InGaN layer. On the basis of the results, we directly observed that the indium atoms originating from the InGaN layer ...[more]

PMID: 36048741

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Project description:In this study, we present a theoretical study of the quantum spin Hall effect in InN/InGaN coupled multiple quantum wells with the individual well widths equal to two atomic monolayers. We consider triple and quadruple quantum wells in which the In content in the interwell barriers is greater than or equal to the In content in the external barriers. To calculate the electronic subbands in these nanostructures, we use the eight-band k∙p Hamiltonian, assuming that the effective spin-orbit interaction in InN is negative, which represents the worst-case scenario for achieving a two-dimensional topological insulator. For triple quantum wells, we find that when the In contents of the external and interwell barriers are the same and the widths of the internal barriers are equal to two monolayers, a topological insulator with a bulk energy gap of 0.25 meV can appear. Increasing the In content in the interwell barriers leads to a significant increase in the bulk energy gap of the topological insulator, reaching about 0.8 meV. In these structures, the topological insulator can be achieved when the In content in the external barriers is about 0.64, causing relatively low strain in quantum wells and making the epitaxial growth of these structures within the range of current technology. Using the effective 2D Hamiltonian, we study the edge states in strip structures containing topological triple quantum wells. We demonstrate that the opening of the gap in the spectrum of the edge states caused by decreasing the width of the strip has an oscillatory character regardless of whether the pseudospin-mixing elements of the effective Hamiltonian are omitted or taken into account. The strength of the finite size effect in these structures is several times smaller than that in HgTe/HgCdTe and InAs/GaSb/AlSb topological insulators. Therefore, its influence on the quantum spin Hall effect is negligible in strips with a width larger than 150 nm, unless the temperature at which electron transport is measured is less than 1 mK. In the case of quadruple quantum wells, we find the topological insulator phase only when the In content in the interwell barriers is larger than in the external barriers. We show that in these structures, a topological insulator with a bulk energy gap of 0.038 meV can be achieved when the In content in the external barriers is about 0.75. Since this value of the bulk energy gap is very small, quadruple quantum wells are less useful for realizing a measurable quantum spin Hall system, but they are still attractive for achieving a topological phase transition and a nonlocal topological semimetal phase.

Project description:Cubic InGaN alloys are a promising candidate material for next-generation optoelectronic applications as they lack internal fields and promise to cover large parts of the electromagnetic spectrum from the deep UV toward the mid-infrared. This demands high-quality epitaxial growth of cubic InGaN/GaN quantum wells, especially for the red energy range. However, the growth of indium-bearing nitride quantum wells in the metastable cubic phase still poses many challenges. InGaN and GaN are typically grown at different temperatures and with different metal fluxes in molecular beam epitaxy, leading to either long waiting periods for temperature adjustment or growth under suboptimal conditions. Both degrade the crystal quality and optical properties. In this study, we apply a metal-modulated growth approach in molecular beam epitaxy that enables us to grow either self-assembled, phase pure, cubic InGaN/GaN multi quantum wells (MQWs) or homogeneous c-InGaN layers, only by adjusting the shutter duration times for Ga and In. We achieve smooth surfaces and sharp interfaces with a quantum well thickness tunable from 6 to 16 nm and a barrier thickness ranging from 4 to 10 nm. X-ray diffraction confirms >99% phase purity of our cubic layers, while time-of-flight secondary ion mass spectrometry, scanning transmission electron microscopy, and energy-dispersive X-ray spectroscopy provide detailed information on the quantum well composition and strain. Photoluminescence measurements at room temperature demonstrate the emission properties of the samples, with the emission wavelength ranging from 540 to 670 nm. Changing the barrier and QW thickness results in a shift of emission energy of up to 400 meV, which is explained by quantum confinement and strain. The high interface quality and excellent optical properties of the quantum wells without the need for multiple metal sources or long waiting times represent a significant advance in the development of next-generation optoelectronic devices.

Dataset Information

Atomic Diffusion of Indium through Threading Dislocations in InGaN Quantum Wells.

Publications

Atomic Diffusion of Indium through Threading Dislocations in InGaN Quantum Wells.

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