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Influence of SiO2 or h-BN substrate on the room-temperature electronic transport in chemically derived single layer graphene.


ABSTRACT: The substrate effect on the electronic transport of graphene with a density of defects of about 0.5% (0.5%G) is studied. Devices composed of monolayer 0.5%G, partially deposited on SiO2 and h-BN were used for transport measurements. We find that the 0.5%G on h-BN exhibits ambipolar transfer behaviours under ambient conditions, in comparison to unipolar p-type characters on SiO2 for the same flake. While intrinsic defects in graphene cause scattering, the use of h-BN as a substrate reduces p-doping.

SUBMITTER: Wang Z 

PROVIDER: S-EPMC9075750 | biostudies-literature | 2019 Nov

REPOSITORIES: biostudies-literature

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Influence of SiO<sub>2</sub> or h-BN substrate on the room-temperature electronic transport in chemically derived single layer graphene.

Wang Zhenping Z   Yao Qirong Q   Hu Yalei Y   Li Chuan C   Hußmann Marleen M   Weintrub Ben B   Kirchhof Jan N JN   Bolotin Kirill K   Taniguchi Takashi T   Watanabe Kenji K   Eigler Siegfried S  

RSC advances 20191121 65


The substrate effect on the electronic transport of graphene with a density of defects of about 0.5% (<sup>0.5%</sup>G) is studied. Devices composed of monolayer <sup>0.5%</sup>G, partially deposited on SiO<sub>2</sub> and h-BN were used for transport measurements. We find that the <sup>0.5%</sup>G on h-BN exhibits ambipolar transfer behaviours under ambient conditions, in comparison to unipolar p-type characters on SiO<sub>2</sub> for the same flake. While intrinsic defects in graphene cause sc  ...[more]

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