High-performance and low-power source-gated transistors enabled by a solution-processed metal oxide homojunction.

ABSTRACT: Cost-effective fabrication of mechanically flexible low-power electronics is important for emerging applications including wearable electronics, artificial intelligence, and the Internet of Things. Here, solution-processed source-gated transistors (SGTs) with an unprecedented intrinsic gain of ~2,000, low saturation voltage of +0.8 ± 0.1 V, and a ~25.6 μW power consumption are realized using an indium oxide In₂O₃/In₂O₃:polyethylenimine (PEI) blend homojunction with Au contacts on Si/SiO₂. Kelvin probe force microscopy confirms source-controlled operation of the SGT and reveals that PEI doping leads to more effective depletion of the reverse-biased Schottky contact source region. Furthermore, using a fluoride-doped AlO_x gate

SUBMITTER: Zhuang X 

PROVIDER: S-EPMC9934017 | biostudies-literature | 2023 Jan

REPOSITORIES: biostudies-literature